Transparent Silica Films Deposited by Low-Temperature Plasma-Enhanced CVD Using Hexamethyldisiloxane

Effect of deposition temperature on the

Effect of deposition temperature on the properties of thin polymer films deposited by plasma-enhanced CVD using cyclo-hexa-hydrocarbons as monomers

✍ Kazunori Moriki; Tetsuji Satoh; Atsushi Itabashi; Motoshige Yumoto 📂 Article 📅 2010 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 454 KB 👁 2 views

## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 °C in a vacuum process. It also provides good thickness controllability and uniformity of the depos