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Low-temperature deposition of hafnium silicate gate dielectrics

✍ Scribed by Punchaipetch, P.; Pant, G.; Quevedo-Lopez, M.A.; Yao, C.; El-Bouanani, M.; Kim, M.J.; Wallace, R.M.; Gnade, B.E.

No coin nor oath required. For personal study only.

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