UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

✍ Scribed by S.Y. Son; J.H. Jang; P. Kumar; K. Ramani; V. Craciun; R.K. Singh

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 416 KB
• Volume: 254
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2008.05.222