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Low-energy electron-beam lithography of hydrogen silsesquioxane

✍ Scribed by Haifang Yang; Aizi Jin; Qiang Luo; Changzhi Gu; Zheng Cui; Yifang Chen

Book ID
108207559
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
191 KB
Volume
83
Category
Article
ISSN
0167-9317

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In the frame of the European project MAGIC, a massively multibeam tool working at 5 kV is under installation in LETI premises. Because of its high resolution capability and suitable high exposure dose, hydrogen silsesquioxane (HSQ) is a good candidate for evaluating tool performances. In order to pr