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New approach of Monte Carlo simulation for low energy electron beam lithography

✍ Scribed by Soo-Hwan Kim; Young-Mog Ham; Wongyu Lee; Kukjin Chun

Book ID: 114155766
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 262 KB
Volume: 41-42
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(98)00040-9

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