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Benchmark test of Monte-Carlo simulation for high resolution electron beam lithography

✍ Scribed by Rommel, Marcus; Hoffmann, Karl E.; Reindl, Thomas; Weis, Jürgen; Unal, Nezih; Hofmann, Ulrich

Book ID
118223297
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
727 KB
Volume
98
Category
Article
ISSN
0167-9317

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The electron backscattering coefficients of thin tri-level-process layer systems in the energy range from 2.5 to 40.0 keV have been calculated by Monte Carlo simulations. The results show a significant variation of the backscattering with the primary electron energy and the atomic number of the mate