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Monte carlo simulation of spatially distributed beams in electron-beam lithography


Book ID
108389442
Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
145 KB
Volume
26
Category
Article
ISSN
0042-207X

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The electron backscattering coefficients of thin tri-level-process layer systems in the energy range from 2.5 to 40.0 keV have been calculated by Monte Carlo simulations. The results show a significant variation of the backscattering with the primary electron energy and the atomic number of the mate