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Layered tantalum-aluminum oxide films deposited by atomic layer epitaxy

✍ Scribed by H. Kattelus; M. Ylilammi; J. Saarilahti; J. Antson; S. Lindfors

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 223 KB
Volume: 225
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(93)90173-m

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