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Laser annealing of hydrogenated amorphous silicon–carbon films

✍ Scribed by U. Coscia; G. Ambrosone; C. Minarini; V. Parisi; S. Schutzmann; A. Tebano; S. Restello; V. Rigato

Book ID
113936576
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
157 KB
Volume
453-454
Category
Article
ISSN
0040-6090

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Laser annealing study of PECVD deposited
Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films
✍ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well