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Laser annealing of hydrogenated amorphous silicon

✍ Scribed by J. I. Pankove; C. P. Wu; C. W. Magee; J. T. McGinn

Book ID
112903015
Publisher
Springer US
Year
1980
Tongue
English
Weight
248 KB
Volume
9
Category
Article
ISSN
0361-5235

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πŸ“œ SIMILAR VOLUMES

Laser annealing study of PECVD deposited
Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films
✍ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well