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Ultrashort laser-pulse annealing of hydrogenated amorphous silicon

โœ Scribed by P. H. Liang; C. J. Fang; D. S. Jiang; P. Wagner; L. Ley


Publisher
Springer
Year
1981
Tongue
English
Weight
480 KB
Volume
26
Category
Article
ISSN
1432-0630

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Laser annealing study of PECVD deposited
โœ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well