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Crystallization of hydrogenated amorphous silicon carbon films with laser and thermal annealing

โœ Scribed by D.K. Basa; G. Ambrosone; U. Coscia; A. Setaro

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
436 KB
Volume
255
Category
Article
ISSN
0169-4332

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๐Ÿ“œ SIMILAR VOLUMES

Laser annealing study of PECVD deposited
Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films
โœ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well