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Kinetics of Si2H2 produced by the 193 nm photolysis of disilane

✍ Scribed by Yoshiki Nakajima; Kenichi Tonokura; Kazuko Sugimoto; Mitsuo Koshi

Publisher: John Wiley and Sons
Year: 2001
Tongue: English
Weight: 189 KB
Volume: 33
Category: Article
ISSN: 0538-8066
DOI: 10.1002/1097-4601(200102)33:2<136::aid-kin1006>3.0.co;2-h

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