Tbe Sic, radical was found to be formed easily by the I93 nm photolysis of phenylsilane, both in the cell and molecular beam conditions. The reactivity of the radical in the ground state was quite low. Even in the electronically excited A state, it is inert towards saturated hydrocarbons. The rate o
Formation of hot hexafluorobenzene in the 193 nm photolysis
β Scribed by T. Ichimura; Y. Mori; N. Nakashima; K. Yoshihara
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 518 KB
- Volume
- 104
- Category
- Article
- ISSN
- 0009-2614
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β¦ Synopsis
Time-resolved absorption spectra of hesafluorobenzene vapor have been observed with ArF laser (193 nm) exitation. The initial intermediate is posrulated to be due to HFBi(S,) (hot he\afluorobenzene with internal energ of 639 kJ/mol) because the transient spectrum can be simulated as part of the S, ('E,,) + So transition at 3050 I<.
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