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IR laser-induced process for chemical vapor deposition of polyselenocarbosilane films

✍ Scribed by Magna Santos; Luis Díaz; Markéta Urbanová; Dana Pokorná; Zdeněk Bastl; Jan Šubrt; Josef Pola


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
471 KB
Volume
76
Category
Article
ISSN
0165-2370

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## Continuous -wave CO 2 -laser-induced gas-phase decomposition of H 3 SiOSiH 3 , dominated by elimination and polymerization of transient silanone H 2 Si=O and yielding silane and hydrogen as side-products, represents a convenient process for chemical vapour deposition of poly(hydridosiloxane) fi

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Solid perhydridosilicone films have been produced by transversely excited atmospheric (TEA) and continuous-wave CO 2 laser-induced gas-phase decompositions of H 3 SiOSiH 3 controlled by elimination and polymerization of transient silanone H 2 Si=O and affording silane and hydrogen as side products.