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Laser-induced chemical vapor deposition of titanium diboride

✍ Scribed by J. Elders; J.D.W. van Voorst


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
492 KB
Volume
54
Category
Article
ISSN
0169-4332

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Titanium nitride (TiN) films were deposited onto Ti-6Al-4V substrates by laser chemical vapor deposition using a cw CO 2 laser and TiCl 4 , N 2 and H 2 reactant gases. Laser-induced fluorescence (LIF) and pyrometry determined relative titanium gas phase atomic number density and deposition temperatu