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Investigation of polishing characteristics of shallow trench isolation chemical mechanical planarization with different types of slurries

✍ Scribed by Sang-Ick Lee; Jinho Hwang; Hyoungjae Kim; Haedo Jeong


Book ID
108207689
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
773 KB
Volume
84
Category
Article
ISSN
0167-9317

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