✦ LIBER ✦
Shallow Trench Isolation Characteristics with High-Density-Plasma Chemical Vapor Deposition Gap-Fill Oxide for Deep-Submicron CMOS Technologies
✍ Scribed by Lee, Seung-Ho; Son, Jeong-Hwan; Lee, Hi-Deok; Yang, Wouns; Lee, Young-Jong
- Book ID
- 111942863
- Publisher
- Institute of Pure and Applied Physics
- Year
- 1998
- Tongue
- English
- Weight
- 884 KB
- Volume
- 37
- Category
- Article
- ISSN
- 0021-4922
No coin nor oath required. For personal study only.