Electrochemical impedance characteristics of Ta/Cu contact regions in polishing slurries used for chemical mechanical planarization of Ta and Cu: considerations of galvanic corrosion

✍ Scribed by K.A. Assiongbon; S.B. Emery; V.R.K. Gorantla; S.V. Babu; D. Roy

• Book ID: 116384370
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 308 KB
• Volume: 48
• Category: Article
• ISSN: 0010-938X
• DOI: 10.1016/j.corsci.2005.01.008