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Investigation of BF2+ implants in silicon through SiO2 films Redistribution of fluorine and boron under rapid thermal annealing

โœ Scribed by L. Kaabi; C. Gontrand; M. Lemiti; B. Remaki; B. Balland; J. Meddeb; O. Marty


Book ID
114168396
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
588 KB
Volume
120
Category
Article
ISSN
0168-583X

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