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BF2 ion implantation in silicon through surface oxides, behaviour of the fluorine with rapid thermal annealing

โœ Scribed by M.C. Ozturk; J.J. Wortman; W.K. Chu; G. Rozgonyi; D.P. Griffis


Book ID
118230948
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
353 KB
Volume
5
Category
Article
ISSN
0167-577X

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