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On the origins of structural defects in BF2+-implanted and rapid-thermally-annealed silicon: Conditions for defect-free regrowth

✍ Scribed by T. Sands; J. Washburn; E. Myers; D.K. Sadana


Book ID
113277283
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
631 KB
Volume
7-8
Category
Article
ISSN
0168-583X

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