✦ LIBER ✦
The effect of rapid thermal treatments on the formation of shallow junctions by implanting boron and BF2+ ions into (100) silicon through a protecting mask
✍ Scribed by L. Kaabi; B. Remaki; C. Gontrand; P.F. Lo; B. Balland
- Book ID
- 113287438
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 490 KB
- Volume
- 112
- Category
- Article
- ISSN
- 0168-583X
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