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Intermetal dielectric deposition by electron cyclotron resonance chemical vapor deposition (ECR CVD)

โœ Scribed by Stephan E. Lassig; James D. Tucker


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
862 KB
Volume
26
Category
Article
ISSN
0026-2692

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The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o