Heteroepitaxy of AlN on α-Al2O3 by electron cyclotron resonance plasma-assisted chemical vapor deposition at low temperatures

Effects of process parameters on the str

Effects of process parameters on the structure of hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

✍ Dong Xie; Hengjun Liu; Xingrui Deng; Y.X. Leng; Nan Huang 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 450 KB

The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o