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Influence of source gas supply sequence on hydride vapor phase epitaxy of AlN on (0001) sapphire substrates

✍ Scribed by Rie Togashi; Toru Nagashima; Manabu Harada; Hisashi Murakami; Yoshinao Kumagai; Hiroyuki Yanagi; Akinori Koukitu


Book ID
116630064
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
470 KB
Volume
360
Category
Article
ISSN
0022-0248

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