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Influence of secondary effects on the structure quality in deep X-ray lithography

✍ Scribed by F.J. Pantenburg; J. Mohr

Book ID
113285146
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
657 KB
Volume
97
Category
Article
ISSN
0168-583X

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Deep X-ray lithography with synchrotron radiation (DXRL) constitutes the key microfabrication process step in the LIGA technology. Microcomponents with a height of some gm up to several mm can be manufactured with sub-gm precision. The pattern transfer accuracy is governed by technological constrain