Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography

✍ Scribed by G. Aigeldinger; C.-Y. P. Yang; D. M. Skala; D. H. Morse; A. A. Talin; S. K. Griffiths; J. T. Hachman; J. T. Ceremuga

• Publisher: Springer-Verlag
• Year: 2007
• Tongue: English
• Weight: 576 KB
• Volume: 14
• Category: Article
• ISSN: 0946-7076
• DOI: 10.1007/s00542-007-0419-9