Influence of rapid thermal annealing (RTA) on the structural and electrical properties of SnS films
β Scribed by M. Devika; N. Koteeswara Reddy; S. Venkatramana Reddy; K. Ramesh; K. R. Gunasekhar
- Publisher
- Springer US
- Year
- 2008
- Tongue
- English
- Weight
- 343 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0957-4522
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π SIMILAR VOLUMES
Two groups of Mn films with different mass thicknesses were evaporated onto quartz-glass substrates under vacuum conditions (p = IO-' Pa). The Mn films of the first group were thermally annealed at a temperature of approximately 674 K for half an hour. The other group of the films were obtained with
The influence of rapid thermal annealing of 700Β°C and 800Β°C in 5x 10e5 mbar vacuum on the structure and morphology of aluminum and silver thin films, deposited on quartz substrates is investigated. The metal films studied have thicknesses of 200 nm and 120 nm for AI and Ag, respectively, when the a