Influence of vacuum rapid thermal annealing on the properties of Al and Ag films on quartz

✍ Scribed by V Lasarova; G Beshkov; L Spassov

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 364 KB
• Volume: 47
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(96)00187-x

✦ Synopsis

The influence of rapid thermal annealing of 700°C and 800°C in 5x 10e5 mbar vacuum on the structure and morphology of aluminum and silver thin films, deposited on quartz substrates is investigated.

The metal films studied have thicknesses of 200 nm and 120 nm for AI and Ag, respectively, when the annealing rime ranges from 5 to 180 s. A recrystallization process in the Al films is observed. A correlation between the annealing rime and the equivalent parameters' change of the quartz resonators with silver electrodes is also found.