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Influence of rapid thermal annealing on the properties of SnO2 thin films

✍ Scribed by G. Beshkov; K. Kolentsov; L. Yourukova; A. Rachkova; D. Mateeva

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
787 KB
Volume
30
Category
Article
ISSN
0921-5107

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HfO 2 thin films have been deposited on Si substrate by radio frequency reactive magnetron sputtering. The optical and structural properties of HfO 2 thin films in relation to rapid thermal annealing (RTA) temperatures are investigated by spectroscopic ellipsometry (SE), X-ray diffraction (XRD) and