✦ LIBER ✦

Influence of nitrogen concentration on grain growth, structural and electrical properties of sputtered aluminum nitride films

✍ Scribed by J.P. Kar; G. Bose; S. Tuli

Book ID: 113896040
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 701 KB
Volume: 54
Category: Article
ISSN: 1359-6462
DOI: 10.1016/j.scriptamat.2006.01.038

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Influence of nitrogen gas flow rate on t

Influence of nitrogen gas flow rate on the structural, morphological and electrical properties of sputtered TiN films

✍ Nishat Arshi, Junqing Lu, Yun Kon Joo… 📂 Article 📅 2012 🏛 Springer US 🌐 English ⚖ 790 KB

Effect of nitrogen concentration to the

Effect of nitrogen concentration to the structural, chemical and electrical properties of tantalum zirconium nitride films

✍ Z.Z. Tang 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 492 KB

Influence of argon gas flow on mechanica

Influence of argon gas flow on mechanical and electrical properties of sputtered titanium nitride thin films

✍ Kaykhosrow Khojier, Hadi Savaloni, Ebrahim Shokrai, Zohreh Dehghani, Naser Zare 📂 Article 📅 2013 🏛 Springer-Verlag 🌐 English ⚖ 413 KB

Electrical and structural properties of

Electrical and structural properties of tantalum nitride thin films deposited by sputtering

✍ R. Petrović; T. Nenadović; N. Kraljević; T. Dimitrijević 📂 Article 📅 1979 🏛 Elsevier Science 🌐 English ⚖ 437 KB

The structural and acoustic properties o

The structural and acoustic properties of sputtered aluminum nitride on ST-X quartz

✍ Sean Wu; Long Wu; Feng-Chih Chang; Yu-Tang Shen; Jia-Hua Chang 📂 Article 📅 2001 🏛 Springer 🌐 English ⚖ 138 KB

Effect of nitrogen flow ratio on the str

Effect of nitrogen flow ratio on the structural and optical properties of aluminum nitride thin films

✍ Shinho Cho 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 674 KB

Aluminum nitride (AlN) films have been deposited on glass substrates at various nitrogen flow ratios by rf reactive magnetron sputtering. The AlN film deposited at 10% of nitrogen flow ratio shows a strongly c-axis preferred orientation with a crystalline size of 100 nm, thickness of 1100 nm, and ba