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Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3

✍ Scribed by Li, Xingcun; Lei, Wenwen; Zhao, Qiao; Chen, Qiang

Book ID: 121997915
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 866 KB
Volume: 228
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2012.08.041

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