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Influence of argon plasma on the deposition of Al2O3film onto the PET surfaces by atomic layer deposition

✍ Scribed by Riyanto Edy, Xiaojiang Huang, Ying Guo, Jing Zhang…

Book ID
120947724
Publisher
Springer-Verlag
Year
2013
Tongue
English
Weight
733 KB
Volume
8
Category
Article
ISSN
1931-7573

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✍ Per Ericsson; Stefan Bengtsson; Jarmo Skarp 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 293 KB

A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900°C resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i