𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Influence of interfaces density and thermal processes on mechanical stress of PECVD silicon nitride

✍ Scribed by A. Picciotto; A. Bagolini; P. Bellutti; M. Boscardin

Book ID
108064117
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
255 KB
Volume
256
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Influence of mechanical stress on therma
Influence of mechanical stress on thermal oxidation phenomena of silicon
✍ D. Knoll; T. Grabolla; E. Bugiel πŸ“‚ Article πŸ“… 1987 πŸ› John Wiley and Sons 🌐 English βš– 575 KB

## Influence of Mechanical Stress on Thermal Oxidation Phenomena of Silicon Some phenomena of the thermal wet oxidation of polycrystalline silicon structures are discussed in connection with the geometry of this structures and mechanical stress present in the growing oxide layer. A model is presen