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Influence of mechanical stress on thermal oxidation phenomena of silicon

✍ Scribed by D. Knoll; T. Grabolla; E. Bugiel

Publisher
John Wiley and Sons
Year
1987
Tongue
English
Weight
575 KB
Volume
22
Category
Article
ISSN
0232-1300

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✦ Synopsis

Influence of Mechanical Stress on Thermal Oxidation Phenomena of Silicon

Some phenomena of the thermal wet oxidation of polycrystalline silicon structures are discussed in connection with the geometry of this structures and mechanical stress present in the growing oxide layer. A model is presented considering the influence of the stress on the linear and parabolic oxidation rate constants. Basing on this model experimental results concerning the influence of oxidation parameters on the oxidepolysilicon interface structure and on closely related electrical properties can be explained.

&Is werden einige Phanoniene bei der thermischen Feuchtoxidation von polykristallinen Silizium-Strukturen in Zusamnienhang mit der Geometrie dieser Strukturen und mechanischen Spannungen in der wachsenden Oxidschicht diskutiert. Ein Model1 wird vorgestellt, das den EinfluB dieser Spannungen auf die lineare und parabolische Oxydationsratenkonstante beriicksichtigt. Mit Hilfe diescs Modells lassen sich experimentelle Ergebnisse zum EinfluB der Oxydationsbedingungen auf die Ausbildung der poly-Siliziuni/Oxid-Grenzflachenstruktur und damit eng verbundener elektrischer Eigenschaften dieser Struktur interpretieren.

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