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Evolution of the mechanical stress on PECVD silicon oxide films under thermal processing

✍ Scribed by J. A. Rodríguez; A. Llobera; C. Domínguez

Book ID
110240238
Publisher
Springer
Year
2000
Tongue
English
Weight
45 KB
Volume
19
Category
Article
ISSN
0261-8028

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✍ D. Knoll; T. Grabolla; E. Bugiel 📂 Article 📅 1987 🏛 John Wiley and Sons 🌐 English ⚖ 575 KB

## Influence of Mechanical Stress on Thermal Oxidation Phenomena of Silicon Some phenomena of the thermal wet oxidation of polycrystalline silicon structures are discussed in connection with the geometry of this structures and mechanical stress present in the growing oxide layer. A model is presen