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Influence of an epitaxial Si capping of Ge islands on Si(0 0 1) and Si(1 1 0) by LPCVD

✍ Scribed by P. Ferrandis; L. Vescan; B. Holländer; V. Dashtizadeh; C. Dieker


Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
70 KB
Volume
17
Category
Article
ISSN
1386-9477

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Adding a phosphorus-containing species during chemical vapor deposition of Ge islands on Si(0 0 1) modiÿes the island sizes and shapes, primarily by changing the surface energies and the relative surface energies of di erent surface facets. Three distinct island shapes occur, but the island types an