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Inductively coupled plasmas: Optimizing the inductive-coupling efficiency for large-area source design

โœ Scribed by Colpo, P.; Meziani, T.; Rossi, F.


Book ID
125445191
Publisher
AVS (American Vacuum Society)
Year
2005
Tongue
English
Weight
748 KB
Volume
23
Category
Article
ISSN
0734-2101

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A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin