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Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition

✍ Scribed by Giuliani, J.L.; Shamamian, V.A.; Thomas, R.E.; Apruzese, J.P.; Mulbrandon, M.; Rudder, R.A.; Hendry, R.C.; Robson, A.E.

Book ID: 114558833
Publisher: IEEE
Year: 1999
Tongue: English
Weight: 488 KB
Volume: 27
Category: Article
ISSN: 0093-3813
DOI: 10.1109/27.799808

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