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[IEEE IEEE 29th International Conference on Plasma Sciences - Banff, Alta., Canada (26-30 May 2002)] IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340) - Deposition of nano-sized metal-oxide using inductively coupled plasma chemical vapor deposition (ICP-CVD) technique for gas sensors applications

✍ Scribed by Srivastava, A.; Tan, O.K.; Ang, L.K.; Tse, M.S.; Lee, Y.C.

Book ID: 111901937
Publisher: IEEE
Year: 2002
Weight: 59 KB
Volume: 0
Category: Article
ISBN-13: 9780780374072
DOI: 10.1109/plasma.2002.1030313

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