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An array of inductively coupled plasma sources for large area plasma

✍ Scribed by Se-Geun Park; Chul Kim; Beom-hoan O

Book ID
114086821
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
250 KB
Volume
355-356
Category
Article
ISSN
0040-6090

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A large area (830 mm Γ‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin