Internal linear inductively coupled plas
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Y.J. Lee; K.N. Kim; B.K. Song; G.Y. Yeom
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Article
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2002
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Elsevier Science
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English
โ 250 KB
A large area (830 mm ร 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin