Hydrogen plasma becomes an alternative to the conventional oxygen plasma in stripping photoresist in the next generation semiconductor processing because the conventional oxygen plasma is known to degrade ultralow dielectric constant films by depleting carbons from the films. An array of hollow cath
β¦ LIBER β¦
Large area high density plasma source by helical resonator arrays
β Scribed by Se-Geun Park; Beom-hoan O; Minyoung Sohn; Jinwoo Kim
- Book ID
- 108422796
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 201 KB
- Volume
- 133-134
- Category
- Article
- ISSN
- 0257-8972
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