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Inductively Coupled Plasma-Assisted RF Magnetron Sputtering Deposition of Highly Uniform SiC Nanoislanded Films

✍ Scribed by Cheng, Qijin; Xu, S.; Huang, Shiyong; Long, Jidong; Ren, Yuping; Xu, Ming; Ostrikov, Kostya

No coin nor oath required. For personal study only.

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