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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

โœ Scribed by Takenaka, Kosuke; Setsuhara, Yuichi; Ebe, Akinori


Book ID
121475636
Publisher
Institute of Pure and Applied Physics
Year
2013
Tongue
English
Weight
875 KB
Volume
52
Category
Article
ISSN
0021-4922

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