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Comparison of CxNy:H films obtained by deposition using magnetron sputtering or an inductively coupled plasma

✍ Scribed by D. A. Zeze; D. R. North; N. M. D. Brown; C. A. Anderson


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
399 KB
Volume
29
Category
Article
ISSN
0142-2421

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