In Situ Reaction Mechanism Studies on the Atomic Layer Deposition of Al 2 O 3 from (CH 3 ) 2 AlCl and Water

✍ Scribed by Matero, Raija; Rahtu, Antti; Ritala, Mikko

• Book ID: 120245224
• Publisher: American Chemical Society
• Year: 2005
• Tongue: English
• Weight: 121 KB
• Volume: 21
• Category: Article
• ISSN: 0743-7463
• DOI: 10.1021/la047153a