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In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al 2 O 3 Thin Films from Trimethylaluminum and Water

✍ Scribed by Juppo, Marika; Rahtu, Antti; Ritala, Mikko; Leskelä, Markku

Book ID: 126887556
Publisher: American Chemical Society
Year: 2000
Tongue: English
Weight: 87 KB
Volume: 16
Category: Article
ISSN: 0743-7463
DOI: 10.1021/la991183+

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## Abstract Atomic layer deposition (ALD) at 100 °C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al~2~O~3~, even after removing the cotton templates. The replicated woven structur