In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al 2 O 3 and HfO 2

✍ Scribed by Rose, Martin; Niinistö, Jaakko; Endler, Ingolf; Bartha, Johann W.; Kücher, Peter; Ritala, Mikko

• Book ID: 120344189
• Publisher: American Chemical Society
• Year: 2010
• Tongue: English
• Weight: 318 KB
• Volume: 2
• Category: Article
• ISSN: 1944-8244
• DOI: 10.1021/am900807a